When it comes to the Dutch ASML company, everyone knows that they are the only EUV lithography machine supplier in the world, and the production of 7nm and below processes depends on their equipment. However, ASML is not just a powerful lithography machine. Today they announced another new product-the first generation HMI multi-beam inspection machine, HMI eScan1000, which is suitable for 5nm and more advanced processes, making the capacity increase by 600%.
With the continuous improvement of process technology, the manufacturing of wafers is becoming more and more complex, which will also cause more errors in the wafer. HMI eScan1000 is a detection system based on HMI multi-beam technology, and there are also complex photoelectric subsystems inside. It can generate and control multiple electron beams, then analyze the wafer quality based on the reflected electron beam imaging, and has a high-speed platform to control the number of wafers tested, and a computing system to process electron beam data.
Simply put, the HMI eScan1000 machine developed by ASML is a system to verify the quality of wafers produced by advanced processes. The more advanced the process, the more important the inspection system. Its inspection accuracy and throughput determine the efficiency of production.
The breakthrough of ASML's HMI eScan1000 is that it can simultaneously generate and control nine electron beams, so the production capacity has been increased by 600%, which can greatly reduce the time used for wafer quality analysis.
At present, HMI eScan1000 can be used for wafer testing of advanced processes of 5nm and below. It has been delivered to customers for testing and verification. In the future, ASML will also launch more beam test equipment to meet customers' requirements for advanced processes.